The disclosure pertains to a capacitively coupled plasma source in which vhf power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
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1. A plasma reactor comprising:
a vacuum chamber enclosure having a ceiling with an electrode;
a coaxial resonator positioned above the vacuum chamber and coupled to the electrode, the coaxial resonator including
a hollow center conductive cylinder;
a cylindrical conductive shell including
a hollow inner conductive cylinder coaxial with and surround by the hollow center conductive cylinder,
a hollow outer conductive cylinder coaxial with and surrounding the hollow center conductive cylinder,
an annular conductor plate extending radially extending between and electrically connecting respective top edges of the inner and outer conductive cylinder, wherein a top edge of the hollow center conductive cylinder is spaced from the annular conductor plate by an axial gap length; and
a power coupler to connect the coaxial resonator to a vhf generator, the power coupler including one or more spoke conductors, each spoke conductor of the one or more spoke conductors including
an inner conductor line that extends through an aperture in the cylindrical conductive shell to connect to the center conductive cylinder, and
an outer conductor coaxially with and surrounding a portion of the inner conductor line outside cylindrical conductive shell, the outer conductor extending to and connected to cylindrical conductive shell.
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This application is a continuation of U.S. patent application Ser. No. 15/793,802, filed Oct. 25, 2017 and issued as U.S. Pat. No. 11,043,361, which is a continuation of U.S. patent application Ser. No. 14/548,692, filed Nov. 20, 2014 and issued as U.S. Pat. No. 9,824,862, which is a divisional of U.S. patent application Ser. No. 13/047,052, filed Mar. 14, 2011 and issued as U.S. Pat. No. 8,920,597, which claims benefit of U.S. Provisional Application Ser. No. 61/375,370, filed Aug. 20, 2010, the disclosures of each of which are incorporated by reference.
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator to an overhead electrode, and in which the coaxial resonator is folded to reduce its length, and VHF power is applied from a symmetrical feeder inside the folded coaxial resonator to enhance uniformity of plasma distribution.
A capacitively coupled plasma source for processing a workpiece, such as a semiconductive wafer, has a fixed impedance match element in the form of a coaxial resonator or tuning stub through which VHF power is applied to a discoid or cylindrically symmetrical overhead electrode. A VHF power generator is connected to the tuning stub at a point along its axis at which the RF impedance matches the impedance of the VHF power generator. One limitation of such a structure is that the coaxial tuning stub is exceptionally long, being on the order of a half wavelength of the VHF generator, which may be 0.93 meters for a VHF frequency of 162 MHz. Another limitation is that the plasma distribution produced by such a source tends to be skewed, or non-uniform in an azimuthal direction. As employed herein, the terms azimuthal and radial are employed to signify directions in a cylindrical structure that are mutually orthogonal: The term radial signifies a direction along a radial line whose origin is the cylindrical axis of symmetry. The term azimuthal signifies a direction of travel along a circumference of the cylindrical structure. Non-uniform plasma distribution in the azimuthal direction may be referred to as skew. Plasma distribution may be skewed because of asymmetrical features of the plasma reactor, such as a bend in the coaxial tuning stub, RF-feeding of the tuning stub from one side, the presence of a slit opening in one side of the chamber wall, and the presence of a pumping port in the floor of the chamber of the plasma reactor.
A plasma reactor includes a vacuum chamber enclosure comprising a ceiling and a cylindrical side wall, the ceiling comprising a center electrode, a dielectric support ring around the center electrode and a workpiece support having a support surface facing the ceiling. The reactor further comprises a coaxial resonator comprising: (a) a hollow outer conductive cylinder coaxial with the cylindrical side wall and having a bottom edge on the dielectric support ring, (b) a hollow center conductive cylinder coaxial with the outer conductive cylinder and having a bottom edge contacting the center electrode, and (c) an annular conductor contacting a top edge of the hollow outer conductive cylinder and contacting a top edge of the hollow center conductive cylinder. The reactor further includes a VHF power generator and a power coupler comprising: (a) an axial center conductor connected at a first end to the VHF generator and extending through an interior of the hollow center conductive cylinder to a second end thereof at a selected axial location; and (b) plural respective spoke conductors extending radially from the second end of the axial center conductor and terminating at and contacting the center conductive cylinder in a circular plane at the selected axial location, the plural respective spoke conductors being symmetrically distributed.
In one embodiment, the selected axial location corresponds to an impedance presented to the power coupler matching an output impedance of the VHF generator.
In one embodiment, the power coupler further comprises an axial grounded outer conductor coaxial with and surrounding the axial conductor of the power coupler, and plural respective grounded spoke outer conductors coaxial with and around respective ones of the plural spoke conductors, the axial grounded outer conductor and the plural grounded spoke outer conductors being joined together near the second end of the axial center conductor.
In a related embodiment, the power coupler further comprises an axial grounded outer conductor coaxial with and surrounding the axial conductor of the power coupler, and a grounded conductive plane extending parallel to and facing the plural spoke conductors.
So that the manner in which the exemplary embodiments of the present invention are attained and can be understood in detail, a more particular description of the invention, briefly summarized above, may be had by reference to the embodiments thereof which are illustrated in the appended drawings. It is to be appreciated that certain well known processes are not discussed herein in order to not obscure the invention.
To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the figures. It is contemplated that elements and features of one embodiment may be beneficially incorporated in other embodiments without further recitation. It is to be noted, however, that the appended drawings illustrate only exemplary embodiments of this invention and are therefore not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.
Plasma source power is applied to the ceiling electrode 120 from a VHF power generator 190 through a fixed impedance matching element. In certain embodiments described herein, the fixed impedance match element embodies a folded coaxial resonator 195, whose length is about half that of the basic coaxial tuning stub mentioned previously herein. This provides an advantageous reduction in size and increased access and serviceability. Specifically, the physical length of the folded coaxial resonator 195 is about a quarter wavelength at the frequency of the VHF generator 190.
The folded coaxial resonator 195 includes an inner conductive hollow cylinder 200 that is coaxial with the ceiling electrode 120. The inner conductive hollow cylinder 200 has a circular bottom edge 200a electrically contacting the top surface of the ceiling electrode 120. The folded coaxial resonator 195 further includes an outer hollow conductive cylinder 205 having a circular bottom edge 205a contacting the top surface of the dielectric ring 125. The inner and outer hollow conductive cylinders 200, 205 are of at least approximately the same axial length, so that their circular top edges 200b, 205b are at the same height above the ceiling electrode 120. The folded coaxial resonator 195 also includes a planar conductive annulus 210 resting upon and electrically connecting the circular top edges 200b, 205b of the inner and outer hollow conductive cylinders 200, 205. The folded coaxial resonator 195 further includes a center hollow conductive cylinder 215 coaxial with the inner and outer hollow conductive cylinders 200, 205 and located between them. Preferably, the radius of the center hollow conductive cylinder 215 may be the geometric mean of the radii of the inner and outer hollow conductive cylinders 200, 205. The center hollow conductive cylinder 215 has a circular bottom edge 215a resting on and in electrical contact with the top surface of the ceiling electrode 120.
A VHF power coupler 220 conducts VHF power from the VHF generator 190 to the center hollow conductive cylinder 215. Thus, the center hollow conductive cylinder 215 is the RF hot center conductor of the folded coaxial resonator 195, while the inner and outer hollow conductive cylinders 200, 205 together with the planar conductive annulus 210 are analogous to a grounded outer conductor of a simple coaxial resonator. The electrical connection of the circular bottom edges 200a, 215a to the ceiling electrode 120 provides the requisite D.C. short, equivalent to the D.C. short at the end of a simple (unfolded) coaxial tuning stub.
As shown in
Conduits and conductors for various utilities extend through the hollow inner cylinder 200. These include electric conductors 250, 252 carrying D.C. current to the plasma steering magnet 155, gas lines 254, 256 carrying process gas to the inner and outer gas manifolds 145a, 145b, and coolant conduits 258, 260 carrying coolant to and from the internal coolant passages 150. The interior of the inner cylinder 200 is devoid of electric fields, so that arcing or electrical breakdown of these utility lines is avoided or minimized.
In preferred embodiments, the VHF power coupler 220 is provided as a coaxial structure in which the axial conductor 222 and each of the spoke conductors 224 is a coaxial transmission line including a center conductor that is RF hot, surrounded by a grounded outer conductor or shield. This coaxial structure is depicted in
Each of the spoke conductors 224a, 224b, 224c embodies a coaxial transmission line structure. Thus, the spoke conductor 224a consists of a center spoke conductor 224a-1 and an outer spoke conductor 224a-2 surrounding the center spoke conductor 224a-1. The center spoke conductor 224a-1 extends radially from the axial center conductor 222-1 and terminates at and is electrically connected to the center conductive cylinder 215. The center spoke conductor 224a-1 is RF hot by reason of its connection to the axial center conductor 222-1. The outer spoke conductor 224a-2 extends from the grounded axial outer conductor 222-2 and is terminated at (and electrically connected to) the inner cylinder 200. The center spoke conductor 224a-1 passes through the hole 226a (without contacting the inner conductive cylinder 200) to contact the center conductive cylinder 215.
The structure of each of the spoke conductors 224a, 224b, 224c is the same. Thus, the spoke conductor 224b consists of a center spoke conductor 224b-1 and an outer spoke conductor 224b-2 surrounding the center spoke conductor 224b-1. The center spoke conductor 224b-1 extends radially from the axial center conductor 222-1 and terminates at the center conductive cylinder 215. The center spoke conductor 224b-1 is RF hot by reason of its connection to the axial center conductor 222-1. The outer spoke conductor 224b-2 extends from the grounded axial outer conductor 222-2 and is terminated at (and electrically connected to) the inner cylinder 200, while the center spoke conductor 224b-1 passes through the hole 226b (without contacting the inner conductive cylinder 200) to contact the center conductive cylinder 215.
In like manner, the spoke conductor 224c consists of a center spoke conductor 224c-1 and an outer spoke conductor 224c-2 surrounding the center spoke conductor 224c-1. The center spoke conductor 224c-1 extends radially from the axial center conductive conductor 222-1 and terminates at the center cylinder 215. The center spoke conductor 224c-1 is RF hot by reason of its connection to the axial center conductor 222-1. The outer spoke conductor 224c-2 extends from the grounded axial outer conductor 222-2 and is terminated at (and electrically connected to) the inner cylinder 200, while the center spoke conductor 224c-1 passes through the hole 226c (without contacting the inner conductive cylinder 200) to contact the center conductive cylinder 215.
The plural center spoke conductors 224a-1, 224b-1 and 224c-1 extend in the radial direction from the axial center conductor 222-1 to electrically contact the center conductive cylinder 215. The area of this contact defines a circular plane. The axial location of this circular plane is selected to be such that the electrical or RF impedance at this location matches the characteristic impedance of 224a, 224b and 224c, respectively, at the frequency of the VHF generator 190. The characteristic impedance of the individual spoke conductors 224a, 224b and 224c is selected such that their total impedance at the junction (the axial conductor bottom end 222b) matches the output impedance of the VHF generator 190 at the frequency of the VHF generator 190.
Preferably, the axial center conductor 222-1 has a radius r1 that is sufficient to enable the axial center conductor to carry a very high VHF current, typical of current at thousands of Watts of VHF power. For example, as depicted in
In order for the folded coaxial resonator 195 to attain at least near-resonance at the frequency of the VHF generator 190, the electrical path length along the interior surface formed by the inner and outer hollow conductive cylinders 200, 205 and the conductive annulus 210 is an integral fraction of the wavelength of the VHF generator. Preferably, this fraction is one-half. Thus, as depicted in
The VHF power coupler 220 with multiple spoke conductors 224 may be employed in cases where the resonator is not folded.
Each of the spoke conductors 224a, 224b, 224c, 224d may have a coaxial structure including center spoke conductors 224a-1, 224b-1, 224c-1, 224d-1, respectively, surrounded by outer spoke conductors 224a-2, 224b-2, 224c-2, 224d-2, respectively. The interior end of the axial center conductor 222-1 provides a common terminal to which the plural center spoke conductors 224a-1, 224b-1, 2242c-1, 224d-1 are connected. The plural center spoke conductors 224a-1, 224b-1, 224c-1, 224d-1 extend in the radial direction from the axial center conductor 222-1 to electrically contact the center conductive cylinder 215. The area of this contact defines a circular plane. The axial location of this plane is selected to be such that the electrical or RF impedance at this location matches the impedance of the VHF generator 190.
As in embodiments previously described here, the ratio between the radii of the inner and outer conductors of the axial conductor 222 is selected to be such that the axial conductor 222 has a characteristic impedance matching that of the VHF generator. The ratios between the inner and outer conductors of each of the spoke conductors 224 is selected to be such that the characteristic impedance of each spoke conductor 224 is n times the VHF generator output impedance, where n is the number of spoke conductors 224. In the embodiment of
The outer spoke conductors 224a-2, 2224b-2, 224c-2, 224d-2 extend from the axial outer conductor 222-2 and form a grounded conductive enclosure. The outer spoke conductors 224a-2, 2224b-2, 224c-2, 224d-2 are terminated slightly away from the interior surface of the center hollow conductive cylinder 215 so as to not electrically contact the center conductive hollow cylinder 215.
The plural spoke conductors 224a through 224d provide an azimuthally symmetrical distribution of VHF power to the center hollow conductive cylinder 215. The result is a more symmetrical distribution of VHF plasma source power on the ceiling electrode 120 and therefore a more uniform distribution of plasma ion density over the workpiece support pedestal 130.
While the foregoing is directed to embodiments of the present invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow.
Collins, Kenneth S., Ramaswamy, Kartik, Carducci, James D., Chen, Zhigang, Ye, Zheng John, Rauf, Shahid, Dorf, Leonid, Misra, Nipun, Markovsky, Igor
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