Patent
   D642605
Priority
Apr 02 2010
Filed
Apr 02 2010
Issued
Aug 02 2011
Expiry
Aug 02 2025
Assg.orig
Entity
unknown
4
20
n/a
The ornamental design for a lid assembly for a substrate processing chamber, as shown and described.

FIG. 1 is a top plan view of a lid assembly for a substrate processing chamber showing our new design.

FIG. 2 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 2 of FIG. 1.

FIG. 3 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 3 of FIG. 1.

FIG. 4 is a side elevation view of the lid assembly of FIG. 1 as viewed from line FIG. 4 of FIG. 1.

FIG. 5 is a side elevation view of the lid assembly of FIG. 1, rotated 180°, as viewed from line FIG. 5 of FIG. 1.

FIG. 6 is an isometric top view of the lid assembly of FIG. 1.

FIG. 7 is another isometric top view of the lid assembly of FIG. 1.

FIG. 8 is an isometric bottom view of the lid assembly of FIG. 1; and,

FIG. 9 is a bottom plan view of the lid assembly of FIG. 1.

The broken line showing of structural features is included for the purpose of illustrating non-claimed subject matter and forms no part of the claimed design.

Ishikawa, Tetsuya, Quach, David H., Tam, Alexander

Patent Priority Assignee Title
D841506, Feb 27 2017 Teledyne FLIR, LLC Detector
D913979, Aug 28 2019 Applied Materials, Inc Inner shield for a substrate processing chamber
D931241, Aug 28 2019 Applied Materials, Inc Lower shield for a substrate processing chamber
D973609, Apr 22 2020 Applied Materials, Inc Upper shield with showerhead for a process chamber
Patent Priority Assignee Title
6050446, Jul 11 1997 Applied Materials, Inc Pivoting lid assembly for a chamber
6110556, Oct 17 1997 Applied Materials, Inc. Lid assembly for a process chamber employing asymmetric flow geometries
6302964, Jun 16 1998 Applied Materials, Inc One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system
6364949, Oct 19 1999 Applied Materials, Inc.; Applied Materials, Inc 300 mm CVD chamber design for metal-organic thin film deposition
6517634, Feb 28 2000 Applied Materials, Inc. Chemical vapor deposition chamber lid assembly
6719851, Sep 26 2000 Applied Materials, Inc.; Applied Materials Inc Lid assembly for opening a process chamber lid and uses therefor
7024105, Oct 10 2003 Applied Materials Inc. Substrate heater assembly
7396480, Feb 26 2004 Applied Materials, Inc. Method for front end of line fabrication
7520957, Feb 26 2004 Applied Materials, Inc. Lid assembly for front end of line fabrication
7767024, Feb 26 2004 Appplied Materials, Inc. Method for front end of line fabrication
7905959, Jul 16 2001 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
20020017243,
20020092471,
20060021573,
20080072820,
20090095221,
20090241833,
20090308318,
20100107977,
D291118, Oct 02 1984 ENGINEERED THERMAL SYSTEMS, INC Cover for a ladle or the like
////
Executed onAssignorAssigneeConveyanceFrameReelDoc
Apr 02 2010Applied Materials, Inc.(assignment on the face of the patent)
Apr 15 2010TAM, ALEXANDERApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0244380861 pdf
Apr 15 2010QUACH, DAVID H Applied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0244380861 pdf
Apr 19 2010ISHIKAWA, TETSUYAApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0244380861 pdf
n/a
Date Maintenance Fee Events


n/a
Date Maintenance Schedule