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Patent
D710062
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Priority
Jun 09 2011
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Filed
Dec 08 2011
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Issued
Jul 29 2014
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Expiry
Jul 29 2028
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Assg.orig
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Entity
unknown
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9
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23
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n/a
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We claim the ornamental design for a roller shaft for semiconductor cleaning, as shown and described.
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FIG. 1 is a front elevational view of a roller shaft for semiconductor cleaning showing our new design;
FIG. 2 is a rear elevation view thereof;
FIG. 3 is a top plan view thereof, the bottom view being a mirror image thereof;
FIG. 4 is a right side view thereof, the left side view being a mirror image thereof;
FIG. 5 is a cross sectional view taken along the line 5-5 of FIG. 1;
FIG. 6 is a front perspective view, at an enlarged scale;
FIG. 7 is a front elevational view thereof, at an enlarged scale;
FIG. 8 is an enlarged view of the area 8 seen in FIG. 3; and,
FIG. 9 is an enlarged view of the area 9 seen in FIG. 4.
The broken line showing depicts environmental subject matter only and forms no part of the claimed design.
Tanaka, Hideaki, Ishibashi, Tomoatsu, Oikawa, Fumitoshi, Hombo, Teruaki
Patent |
Priority |
Assignee |
Title |
D728177, |
Feb 01 2013 |
Ebara Corporation |
Roller shaft for substrate cleaning |
D735427, |
Feb 01 2013 |
Ebara Corporation |
Roller shaft for substrate cleaning |
D769108, |
Aug 06 2014 |
Eberl Iron Works, Inc.; EBERL IRON WORKS, INC |
Rooftop support base |
D959374, |
Nov 13 2020 |
ELECTRICAL GRID MONITORING LTD |
BNC cap assembly |
D961516, |
Jun 26 2020 |
Omron Corporation |
Insulation monitoring device |
ER1028, |
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ER1419, |
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ER1931, |
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ER69, |
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Patent |
Priority |
Assignee |
Title |
5745945, |
Jun 28 1996 |
International Business Machines Corporation |
Brush conditioner for a semiconductor cleaning brush |
6240588, |
Dec 03 1999 |
Lam Research Corporation |
Wafer scrubbing brush core |
6247197, |
Jul 09 1998 |
Lam Research Corporation |
Brush interflow distributor |
6330729, |
Apr 06 1998 |
Micron Technology, Inc. |
Brush alignment platform |
6464796, |
Jul 09 1998 |
Lam Research Corporation |
Methods for applying fluid through a brush interflow distributor |
6467120, |
Sep 08 1999 |
International Business Machines Corporation |
Wafer cleaning brush profile modification |
6502273, |
Nov 08 1996 |
AION CO , LTD |
Cleaning sponge roller |
6523210, |
Apr 05 2000 |
|
Surface charge controlling apparatus for wafer cleaning |
6543084, |
Dec 03 1999 |
Lam Research Corporation |
Wafer scrubbing brush core |
6598255, |
May 22 1998 |
Aion Co., Ltd. |
Cleaning rotary brush |
6684447, |
Nov 08 1996 |
AION CO , LTD |
Cleaning sponge roller |
6802099, |
Sep 28 2001 |
Ebara Corporation |
Cleaning member and cylindrical cleaning element |
6842933, |
Jul 14 2000 |
Ebara Corporation |
Substrate cleaning apparatus and cleaning member |
7735177, |
Feb 10 2006 |
Lam Research Corporation |
Brush core assembly |
7955693, |
Apr 20 2001 |
Hydrofera, LLC |
Foam composition roller brush with embedded mandrel |
8092730, |
Dec 06 2005 |
MORGAN STANLEY SENIOR FUNDING, INC |
Molded rotatable base for a porous pad |
8372210, |
Oct 27 2003 |
Applied Materials, Inc. |
Post CMP scrubbing of substrates |
8444890, |
Apr 20 2001 |
Hydrofera, LLC |
Method of manufacturing a foam composition roller brush |
8460475, |
Dec 06 2005 |
MORGAN STANLEY SENIOR FUNDING, INC |
Molded rotatable base for a porous pad |
8496758, |
Jan 17 2006 |
Fujitsu Semiconductor Limited |
Cleaning apparatus and cleaning method for wafer |
8533895, |
Aug 16 2006 |
MORGAN STANLEY SENIOR FUNDING, INC |
Methods and materials for making a monolithic porous pad cast onto a rotatable base |
20130255720, |
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20130255721, |
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Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a