Patent
   D965740
Priority
Jul 27 2020
Filed
Jan 25 2021
Issued
Oct 04 2022
Expiry
Oct 04 2037
Assg.orig
Entity
unknown
2
19
n/a
The ornamental design for a gas supply nozzle for substrate processing apparatus, as shown and described.

FIG. 1 is a front, top and right side perspective view of a gas supply nozzle for substrate processing apparatus showing our new design;

FIG. 2 is an enlarged portion view taken along line 2-2 in FIG. 1

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a right side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is an enlarged top plan view thereof;

FIG. 10 is an enlarged bottom plan view thereof; and,

FIG. 11 is a cross-sectional view taken along line 11-11 in FIG. 6.

Fujii, Satoshi, Sambu, Makoto

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Executed onAssignorAssigneeConveyanceFrameReelDoc
Dec 24 2020SAMBU, MAKOTOKOKUSAI ELECTRIC CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0550230292 pdf
Dec 24 2020FUJII, SATOSHIKOKUSAI ELECTRIC CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0550230292 pdf
Jan 25 2021KOKUSAI ELECTRIC CORPORATION(assignment on the face of the patent)
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