Electrostatic chuck with improved spacing and charge migration reduction mask

Abstract

Description

FIG. 1 is a top view of the electrostatic chuck having the improved spacing and charge migration reduction mask;

FIG. 2 is an elevation view of the electrostatic chuck when looking up along the y-axis in FIG. 1, the view when looking down along the y-axis being a mirror image of FIG. 2;

FIG. 2A is a detailed view of part of the surface of the electrostatic chuck seen in FIG. 2;

FIG. 3 is a bottom view of the electrostatic chuck;

FIG. 4 is an elevation view of the electrostatic chuck when looking to the right along the x-axis in FIG. 1;

FIG. 4A is a detailed view of part of the surface of the electrostatic chuck seen in FIG. 4;

FIG. 5 is an elevation view of the electrostatic chuck when looking to the left along the x-axis in FIG. 1 and; and,

FIG. 5A is a detailed view of part of the surface of the electrostatic chuck seen in FIG. 5.

Claims

The ornamental design for an electrostatic chuck with improved spacing and charge migration reduction mask, as shown herein.