|
The ornamental design for a electrostatic chuck, as shown and described.
|
|||||||||||||||||
FIG. 1 is a perspective view of the top, front and right side of an electrostatic chuck showing my new design;
FIG. 2 is a front elevational view thereof, the rear elevational view being a mirror image thereof;
FIG. 3 is a right side elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof; and,
FIG. 7 is a sectional view taking along the line 7--7 in FIG. 5.
| Patent | Priority | Assignee | Title |
| 10679884, | Feb 23 2015 | II-VI Incorporated; MARLOW INDUSTRIES, INC ; EPIWORKS, INC ; LIGHTSMYTH TECHNOLOGIES, INC ; KAILIGHT PHOTONICS, INC ; COADNA PHOTONICS, INC ; Optium Corporation; Finisar Corporation; II-VI OPTICAL SYSTEMS, INC ; M CUBED TECHNOLOGIES, INC ; II-VI PHOTONICS US , INC ; II-VI DELAWARE, INC; II-VI OPTOELECTRONIC DEVICES, INC ; PHOTOP TECHNOLOGIES, INC | Film electrode for electrostatic chuck |
| D984972, | Mar 29 2021 | BEIJING NAURA MICROELECTRONICS EQUIPMENT CO , LTD | Electrostatic chuck for semiconductor manufacture |
| ER917, |
| Patent | Priority | Assignee | Title |
| 5535090, | Mar 03 1994 | Electrostatic chuck | |
| 5656093, | Mar 08 1996 | Applied Materials, Inc. | Wafer spacing mask for a substrate support chuck and method of fabricating same |
| 5825607, | May 08 1996 | Applied Materials, Inc. | Insulated wafer spacing mask for a substrate support chuck and method of fabricating same |
| 5838528, | Jul 10 1995 | Applied Materials, Inc | Electrostatic chuck assembly |
| 6081414, | May 01 1998 | Applied Materials, Inc | Apparatus for improved biasing and retaining of a workpiece in a workpiece processing system |
| 6595506, | Nov 17 2000 | TEL EPION INC | Apparatus and method for reduced particulate generation during workpiece handling |
| D406852, | Nov 14 1997 | Applied Materials, Inc | Electrostatic chuck with improved spacing mask and workpiece detection device |
| D407073, | May 08 1996 | Applied Materials, Inc. | Electrostatic chuck with improved spacing and charge migration reduction mask |
| D420022, | May 08 1996 | Applied Materials, Inc. | Electrostatic chuck with improved spacing and charge migration reduction mask |
| D420023, | Nov 14 1997 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
| D425919, | Nov 14 1997 | Applied Materials, Inc | Electrostatic chuck with improved spacing mask and workpiece detection device |
| Executed on | Assignor | Assignee | Conveyance | Frame | Reel | Doc |
| Jun 20 2003 | NGK Spark Plug Co., Ltd. | (assignment on the face of the patent) | / | |||
| Jul 01 2003 | OKUGAWA, KEISUKE | NGK SPARK PLUG CO , LTD | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 014509 | /0064 |
| Date | Maintenance Fee Events |
| Date | Maintenance Schedule |