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The ornamental design for an electrostatic chuck with improved spacing and charge migration reduction mask, as shown and described. |
FIG. 1 is a top view of the electrostatic chuck having the improved spacing and charge migration reduction mask;
FIG. 2 is an elevation view when looking to the right along the x-axis in FIG. 1 , the view when looking to the left along the x-axis in FIG. 1 being identical to that of FIG. 2 thereof;
FIG. 3 is a detailed view of part of the surface seen in FIG. 2 thereof;
FIG. 4 is a bottom view thereof;
FIG. 5 is an elevation view when looking down along the y-axis in FIG. 1 thereof; and,
FIG.6 is an elevation view when looking up along the y-axis in FIG. 1 thereof.
Burkhart, Vincent E., Flanigan, Allen, Sansoni, Steven
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Executed on | Assignor | Assignee | Conveyance | Frame | Reel | Doc |
Dec 01 1997 | SANSONI, STEVEN | Applied Materials, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 008893 | /0300 | |
Dec 04 1997 | FLANIGAN, ALLEN | Applied Materials, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 008893 | /0300 | |
Dec 17 1997 | BURKHART, VINCENT E | Applied Materials, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 008893 | /0300 | |
Dec 24 1997 | Applied Materials, Inc. | (assignment on the face of the patent) | / |
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