Patent
   D490095
Priority
Dec 20 2002
Filed
Jun 20 2003
Issued
May 18 2004
Expiry
May 18 2018
Assg.orig
Entity
unknown
1
11
n/a
The ornamental design for a electrostatic chuck, as shown and described.

FIG. 1 is a perspective view of the top, front and right side of an electrostatic chuck showing my new design;

FIG. 2 is a front elevational view thereof, the rear elevational view being a mirror imge thereof;

FIG. 3 is a right side elevational view thereof;

FIG. 4 is a left side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof; and,

FIG. 7 is a sectional view taking along the line 7--7 in FIG. 5.

Okugawa, Keisuke

Patent Priority Assignee Title
10679884, Feb 23 2015 II-VI Incorporated; MARLOW INDUSTRIES, INC ; EPIWORKS, INC ; LIGHTSMYTH TECHNOLOGIES, INC ; KAILIGHT PHOTONICS, INC ; COADNA PHOTONICS, INC ; Optium Corporation; Finisar Corporation; II-VI OPTICAL SYSTEMS, INC ; M CUBED TECHNOLOGIES, INC ; II-VI PHOTONICS US , INC ; II-VI DELAWARE, INC; II-VI OPTOELECTRONIC DEVICES, INC ; PHOTOP TECHNOLOGIES, INC Film electrode for electrostatic chuck
Patent Priority Assignee Title
5535090, Mar 03 1994 Electrostatic chuck
5656093, Mar 08 1996 Applied Materials, Inc. Wafer spacing mask for a substrate support chuck and method of fabricating same
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6595506, Nov 17 2000 TEL EPION INC Apparatus and method for reduced particulate generation during workpiece handling
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D420022, May 08 1996 Applied Materials, Inc. Electrostatic chuck with improved spacing and charge migration reduction mask
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D425919, Nov 14 1997 Applied Materials, Inc Electrostatic chuck with improved spacing mask and workpiece detection device
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Jun 20 2003NGK Spark Plug Co., Ltd.(assignment on the face of the patent)
Jul 01 2003OKUGAWA, KEISUKENGK SPARK PLUG CO , LTD ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0145080986 pdf
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