Patent
   D900760
Priority
Jul 24 2018
Filed
Jan 23 2019
Issued
Nov 03 2020
Expiry
Nov 03 2035
Assg.orig
Entity
unknown
20
57
n/a
The ornamental design for an ion shield plate for semiconductor manufacturing apparatus, as shown and described.

FIG. 1 is a front, bottom and right side perspective view of an ion shield plate for semiconductor manufacturing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left side elevational view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2.

Kobayashi, Hiroyuki, Kawamura, Kohei, Kobayashi, Michiaki, Kouzuma, Yutaka, Hirozane, Kazuyuki, Miyoshi, Nobuya

Patent Priority Assignee Title
D924824, Jul 24 2018 HITACHI HIGH-TECH CORPORATION Ion shield plate base for semiconductor manufacturing apparatus
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Jan 23 2019HITACHI HIGH-TECH CORPORATION(assignment on the face of the patent)
Mar 15 2019KOUZUMA, YUTAKAHitachi High-Technologies CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0487890410 pdf
Mar 15 2019KOBAYASHI, MICHIAKIHitachi High-Technologies CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0487890410 pdf
Mar 15 2019HIROZANE, KAZUYUKIHitachi High-Technologies CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0487890410 pdf
Mar 15 2019KAWAMURA, KOHEIHitachi High-Technologies CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0487890410 pdf
Mar 15 2019KOBAYASHI, HIROYUKIHitachi High-Technologies CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0487890410 pdf
Mar 16 2019MIYOSHI, NOBUYAHitachi High-Technologies CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0487890410 pdf
Feb 12 2020Hitachi High-Technologies CorporationHITACHI HIGH-TECH CORPORATIONCHANGE OF NAME SEE DOCUMENT FOR DETAILS 0523980249 pdf
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