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The ornamental design for an ion shield plate base for semiconductor manufacturing apparatus, as shown and described.
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The broken line boxes shown in
Ogawa, Yoshifumi, Kobayashi, Michiaki, Kouzuma, Yutaka, Hirozane, Kazuyuki
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Mar 15 2019 | KOUZUMA, YUTAKA | Hitachi High-Technologies Corporation | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 048789 | 0308 | |
Mar 15 2019 | HIROZANE, KAZUYUKI | Hitachi High-Technologies Corporation | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 048789 | 0308 | |
Mar 15 2019 | KOBAYASHI, MICHIAKI | Hitachi High-Technologies Corporation | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 048789 | 0308 | |
Mar 15 2019 | OGAWA, YOSHIFUMI | Hitachi High-Technologies Corporation | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 048789 | 0308 | |
Feb 12 2020 | Hitachi High-Technologies Corporation | HITACHI HIGH-TECH CORPORATION | CHANGE OF NAME SEE DOCUMENT FOR DETAILS | 052398 | 0249 |
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