Integrated type ion shield for semiconductor manufacturing apparatus

Abstract

Description

FIG. 1 is a front, top and right side perspective view of an integrated type ion shield for semiconductor manufacturing apparatus according to the design;

FIG. 2 is a rear, bottom and left side perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof; and,

FIG. 9 is a cross-sectional view taken along line 9-9 of FIG. 7.

Claims

The ornamental design for an integrated type ion shield for semiconductor manufacturing apparatus, as shown and described.