Patent
   D958401
Priority
May 27 2020
Filed
Nov 25 2020
Issued
Jul 19 2022
Expiry
Jul 19 2037
Assg.orig
Entity
unknown
4
17
n/a
The ornamental design for an ion shield plate for plasma processing apparatus, as shown and described.

FIG. 1 is a front, top, and right side perspective view of an ion shield plate for plasma processing apparatus according to the design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a rear elevational view thereof;

FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 2; and,

FIG. 9 is an enlarged view of the portion shown in box 9 in FIG. 8.

The broken lines shown in FIGS. 8 and 9 represent the boundary of enlarged view and form no part of the claimed design.

Tanaka, Kazuumi

Patent Priority Assignee Title
ER348,
ER3481,
ER7016,
ER7701,
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Nov 25 2020HITACHI HIGH-TECH CORPORATION(assignment on the face of the patent)
Dec 02 2020TANAKA, KAZUUMIHITACHI HIGH-TECH CORPORATIONASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0548270829 pdf
Dec 21 2020KAZUUMI, TANAKAHITACHI HIGH-TECH CORPORATIONCORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE PREVIOUSLY RECORDED ON REEL 054827 FRAME 0829 ASSIGNOR S HEREBY CONFIRMS THE ASSIGNMENT OF THE ASSIGNORS INTEREST 0556020969 pdf
Dec 21 2020TANAKA, KAZUUMIHITACHI HIGH-TECH CORPORATIONCORRECTIVE ASSIGNMENT TO CORRECT THE ORDER OF THE INVENTOR S NAME PREVIOUSLY RECORDED ON REEL 055602 FRAME 0969 ASSIGNOR S HEREBY CONFIRMS THE ASSIGNMENT OF THE ASSIGNORS INTEREST 0557420641 pdf
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