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Patent
D958401
Priority
May 27 2020
Filed
Nov 25 2020
Issued
Jul 19 2022
Expiry
Jul 19 2037
Assg.orig
Entity
unknown
4
17
n/a
The ornamental design for an ion shield plate for plasma processing apparatus, as shown and described.
FIG. 1 is a front, top, and right side perspective view of an ion shield plate for plasma processing apparatus according to the design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a left side elevational view thereof;
FIG. 7 is a rear elevational view thereof;
FIG. 8 is a cross-sectional view taken along line 8 -8 of FIG. 2 ; and,
FIG. 9 is an enlarged view of the portion shown in box 9 in FIG. 8 .
The broken lines shown in FIGS. 8 and 9 represent the boundary of enlarged view and form no part of the claimed design.
Tanaka, Kazuumi
Patent
Priority
Assignee
Title
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Date
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Date
Maintenance Schedule
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