Patent
   D352911
Priority
Nov 27 1992
Filed
Feb 08 1993
Issued
Nov 29 1994
Expiry
Nov 29 2008
Assg.orig
Entity
unknown
18
2
n/a
The ornamental design for a processing machine for electron beam lithography system, as shown and described.

FIG. 1 is a front, top and right side elevational perspective view of a processing machine showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a right elevational view thereof;

FIG. 4 is a left elevational view thereof;

FIG. 5 is a top plan elevational view thereof;

FIG. 6 is a bottom plan elevational view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is a front, top and right side elevational perspective view thereof in condition that a drawer on which a keyboard and a mouse pad is disposed .

Yamamoto, Takashi, Miyata, Tomoyuki, Wada, Toshihiko, Ohnuma, Mitsuru, Sato, Seishiro, Hasimoto, Kazunori

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Executed onAssignorAssigneeConveyanceFrameReelDoc
Jan 25 1993YAMAMOTO, TAKASHIHitachi, LTDASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0070070290 pdf
Jan 25 1993MIYATA, TOMOYUKIHitachi, LTDASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0070070290 pdf
Jan 25 1993HASIMOTO, KAZUNORIHitachi, LTDASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0070070290 pdf
Jan 25 1993OHNUMA, MITSURUHitachi, LTDASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0070070290 pdf
Jan 25 1993WADA, TOSHIHIKOHitachi, LTDASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0070070290 pdf
Jan 25 1993SATO, SEISHIROHitachi, LTDASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0070070290 pdf
Feb 08 1993Hitachi, Ltd.(assignment on the face of the patent)
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