Patent
   D365584
Priority
Dec 15 1993
Filed
Jun 06 1994
Issued
Dec 26 1995
Expiry
Dec 26 2009
Assg.orig
Entity
unknown
13
4
n/a
The ornamental design for a semiconductor manufacturing device, as shown.

FIG. 1 is a front view of a semiconductor manufacturing device showing my new design;

FIG. 2 is a rear view thereof;

FIG. 3 is a right side view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a top view thereof; and,

FIG. 6 is a bottom view thereof.

Tozawa, Takashi, Nakagome, Tatsuya

Patent Priority Assignee Title
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D989144, May 14 2021 HITACHI HIGH-TECH CORPORATION Apparatus for evaluating semiconductor substrate
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ER7490,
ER8606,
Patent Priority Assignee Title
4915564, Apr 04 1986 Tokyo Electron Limited Method and apparatus for handling and processing wafer-like materials
5254170, Aug 07 1989 ASM America, Inc Enhanced vertical thermal reactor system
5281320, Dec 21 1979 Novellus Systems, Inc Wafer coating system
D352911, Nov 27 1992 Hitachi, Ltd. Processing machine for electron beam lithography system
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Jun 06 1994Tokyo Electron Kabushiki Kaisha(assignment on the face of the patent)
Jun 06 1994Tokyo Electron Yamanashi Kabushiki Kaisha(assignment on the face of the patent)
Oct 25 1994NAKAGOME, TATSUYATokyo Electron Kabushiki KaishaASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0072020077 pdf
Oct 25 1994TOZAWA, TAKASHITokyo Electron Kabushiki KaishaASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0072020077 pdf
Oct 25 1994NAKAGOME, TATSUYATokyo Electron Yamanashi Kabushiki KaishaASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0072020077 pdf
Oct 25 1994TOZAWA, TAKASHITokyo Electron Yamanashi Kabushiki KaishaASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0072020077 pdf
Mar 24 2001Tokyo Electron Yamanashi Kabushiki KaishaTokyo Electron Kabushiki KaishaASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0116490240 pdf
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