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The ornamental design for a semiconductor manufacturing device, as shown. |
FIG. 1 is a front view of a semiconductor manufacturing device showing my new design;
FIG. 2 is a rear view thereof;
FIG. 3 is a right side view thereof;
FIG. 4 is a left side view thereof;
FIG. 5 is a top view thereof; and,
FIG. 6 is a bottom view thereof.
Tozawa, Takashi, Nakagome, Tatsuya
Patent | Priority | Assignee | Title |
D415184, | Jan 30 1998 | Tokyo Electron Limited | Apparatus for manufacturing a semiconductor for a liquid crystal display |
D415776, | Jan 30 1998 | Tokyo Electron Limited | Apparatus for manufacturing a semiconductor for a liquid crystal display |
D426785, | Jul 09 1999 | Matsushita Electric Industrial Co., Ltd. | Wafer level burn-in tester |
D427088, | Jul 09 1999 | Matsushita Electric Industrial Co., Ltd. | Wafer level burn-in tester |
D546354, | Jul 15 2005 | HITACHI HIGH-TECH CORPORATION | Semiconductor manufacturing apparatus |
D637098, | Oct 30 2009 | HITACHI HIGH-TECH CORPORATION | Semiconductor testing machine |
D905139, | Feb 13 2019 | Agie Charmilles SA | Electrical discharge machine |
D905140, | Feb 13 2019 | GF MACHINING SOLUTIONS AG | Milling machine |
D989144, | May 14 2021 | HITACHI HIGH-TECH CORPORATION | Apparatus for evaluating semiconductor substrate |
D989830, | May 14 2021 | HITACHI HIGH-TECH CORPORATION | Semiconductor substrate transfer apparatus |
D989831, | May 14 2021 | HITACHI HIGH-TECH CORPORATION | Apparatus for evaluating semiconductor substrate |
ER7490, | |||
ER8606, |
Patent | Priority | Assignee | Title |
4915564, | Apr 04 1986 | Tokyo Electron Limited | Method and apparatus for handling and processing wafer-like materials |
5254170, | Aug 07 1989 | ASM America, Inc | Enhanced vertical thermal reactor system |
5281320, | Dec 21 1979 | Novellus Systems, Inc | Wafer coating system |
D352911, | Nov 27 1992 | Hitachi, Ltd. | Processing machine for electron beam lithography system |
Executed on | Assignor | Assignee | Conveyance | Frame | Reel | Doc |
Jun 06 1994 | Tokyo Electron Kabushiki Kaisha | (assignment on the face of the patent) | / | |||
Jun 06 1994 | Tokyo Electron Yamanashi Kabushiki Kaisha | (assignment on the face of the patent) | / | |||
Oct 25 1994 | NAKAGOME, TATSUYA | Tokyo Electron Kabushiki Kaisha | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 007202 | /0077 | |
Oct 25 1994 | TOZAWA, TAKASHI | Tokyo Electron Kabushiki Kaisha | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 007202 | /0077 | |
Oct 25 1994 | NAKAGOME, TATSUYA | Tokyo Electron Yamanashi Kabushiki Kaisha | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 007202 | /0077 | |
Oct 25 1994 | TOZAWA, TAKASHI | Tokyo Electron Yamanashi Kabushiki Kaisha | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 007202 | /0077 | |
Mar 24 2001 | Tokyo Electron Yamanashi Kabushiki Kaisha | Tokyo Electron Kabushiki Kaisha | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 011649 | /0240 |
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