Heat retaining tube base for use in a semiconductor wafer head processing apparatus

Abstract

Description

FIG. 1 a perspective view of a heat retaining tube base for use in a semiconductor wafer heat processing apparatus;

FIG. 2 a front elevational view thereof;

FIG. 3 a top plan view thereof;

FIG. 4 a right side view thereof;

FIG. 5 a bottom plan view thereof; and,

FIG. 6 a cross-sectional view taken along line VI--VI in Fig. 3.

Claims

I claim the ornamental design for a heat retaining tube base for use in a semiconductor wafer heat processing apparatus, as shown and described.