FIG. 1 is a top perspective view of the wafer polishing pad holder showing my new design;
FIG. 2 is a top view of the wafer polishing pad holder showing my new design;
FIG. 3 is a front view of the wafer polishing pad holder showing my new design;
FIG. 4 is a rear view of the wafer polishing pad holder showing my new design;
FIG. 5 is a right side view of the wafer polishing pad holder showing my new design;
FIG. 6 is a left side view of the wafer polishing pad holder showing my new design; and
FIG. 7 is a cross sectional view of the wafer polishing pad holder, taken from FIG. 2 as indicated showing my new design; and,
FIG. 8 is a top view of the wafer polishing pad holder without the milled island within the inside pocket showing my new design.
| Patent |
Priority |
Assignee |
Title |
| D689835, |
Jan 08 2013 |
DIABLO CAPITAL, INC |
Electrostatic carrier tray |
| D702655, |
Oct 15 2012 |
Sumitomo Electric Industries, Ltd. |
Wafer holder for ion implantation |
| D703161, |
Oct 15 2012 |
Sumitomo Electric Industries, Ltd. |
Wafer holder for ion implantation |
| D703162, |
Oct 17 2012 |
Sumitomo Electric Industries, Ltd. |
Wafer holder for stepper |
| D720313, |
Jun 16 2014 |
SOLAERO TECHNOLOGIES CORP |
Semiconductor wafer with dicing positions for solar cell fabrication |
| D731448, |
Oct 29 2013 |
Ebara Corporation |
Polishing pad for substrate polishing apparatus |
| D748593, |
Mar 05 2014 |
HZO, INC |
Boat for use in a material deposition apparatus |
| D760180, |
Feb 21 2014 |
HZO, INC |
Hexcell channel arrangement for use in a boat for a deposition apparatus |
| D766850, |
Mar 28 2014 |
Tokyo Electron Limited |
Wafer holder for manufacturing semiconductor |
| D769200, |
May 15 2013 |
Ebara Corporation |
Elastic membrane for semiconductor wafer polishing apparatus |
| D770990, |
May 15 2013 |
Ebara Corporation |
Elastic membrane for semiconductor wafer polishing apparatus |
| D784937, |
Nov 13 2014 |
Tokyo Electron Limited |
Dummy wafer |
| D785576, |
Nov 13 2014 |
Tokyo Electron Limited |
Dummy wafer |
| D786810, |
Nov 13 2014 |
Tokyo Electron Limited |
Dummy wafer |
| D803917, |
Jun 16 2015 |
KOKUSAI ELECTRIC CORPORATION |
Heat reflector for substrate processing apparatus |
| D804556, |
Jun 16 2015 |
KOKUSAI ELECTRIC CORPORATION |
Heat reflector for substrate processing apparatus |
| D808349, |
May 15 2013 |
Ebara Corporation |
Elastic membrane for semiconductor wafer polishing apparatus |
| D813180, |
May 15 2013 |
Ebara Corporation |
Elastic membrane for semiconductor wafer polishing apparatus |
| ER1922, |
|
|
|
| ER2449, |
|
|
|
| ER2608, |
|
|
|
| ER511, |
|
|
|
| ER5712, |
|
|
|
| ER8850, |
|
|
|
| Patent |
Priority |
Assignee |
Title |
| 2740237, |
|
|
|
| 4081928, |
May 16 1974 |
Texas Instruments Incorporated |
Silicon slice carrier block and plug assembly |
| 4165584, |
Jan 27 1977 |
ITT Corporation |
Apparatus for lapping or polishing materials |
| 4512113, |
Sep 23 1982 |
|
Workpiece holder for polishing operation |
| 4780991, |
Aug 22 1986 |
SpeedFam-IPEC Corporation |
Mask and pressure block for ultra thin work pieces |
| 5193316, |
Oct 29 1991 |
Texas Instruments Incorporated |
Semiconductor wafer polishing using a hydrostatic medium |
| 5533924, |
Sep 01 1994 |
Round Rock Research, LLC |
Polishing apparatus, a polishing wafer carrier apparatus, a replacable component for a particular polishing apparatus and a process of polishing wafers |
| 5597346, |
Mar 09 1995 |
Texas Instruments Incorporated |
Method and apparatus for holding a semiconductor wafer during a chemical mechanical polish (CMP) process |
| 5647789, |
Nov 01 1993 |
Fujikoshi Kakai Kogyo Kabushiki Kaisha |
Polishing machine and a method of polishing a work |
| 5788560, |
Jan 25 1996 |
SHIN-ETSU HANDOTAI CO , LTD |
Backing pad and method for polishing semiconductor wafer therewith |
| 6402594, |
Jan 18 1999 |
Shin-Etsu Handotai Co., Ltd. |
Polishing method for wafer and holding plate |
| 6425809, |
Feb 15 1999 |
Ebara Corporation |
Polishing apparatus |
| 6612905, |
Apr 23 2001 |
|
Silicon wafer polishing holder and method of use thereof |
| 6645049, |
Apr 23 2001 |
|
Polishing holder for silicon wafers and method of use thereof |
| 6699104, |
Sep 15 1999 |
Rohm and Haas Electronic Materials CMP Holdings, Inc |
Elimination of trapped air under polishing pads |
| 6722949, |
Mar 20 2001 |
Taiwan Semiconductors Manufacturing Co., Ltd |
Ventilated platen/polishing pad assembly for chemcial mechanical polishing and method of using |
| 6887138, |
Jun 20 2003 |
SHENZHEN XINGUODU TECHNOLOGY CO , LTD |
Chemical mechanical polish (CMP) conditioning-disk holder |
| 7462094, |
Sep 26 2006 |
Disco Corporation |
Wafer grinding method |
| 7534162, |
Sep 06 2005 |
SHENZHEN XINGUODU TECHNOLOGY CO , LTD |
Grooved platen with channels or pathway to ambient air |
| 7572173, |
Nov 24 2006 |
National Taiwan University of Science and Technology |
Polishing apparatus and pad replacing method thereof |
| 7632170, |
Jun 25 2007 |
Novellus Systems, Inc. |
CMP apparatuses with polishing assemblies that provide for the passive removal of slurry |
| 7731567, |
Sep 26 2006 |
Disco Corporation |
Semiconductor wafer processing method |
| 20020160693, |
|
|
|
| 20040053566, |
|
|
|
| 20050041234, |
|
|
|
| 20050095963, |
|
|
|
| 20050170616, |
|
|
|
| 20060079160, |
|
|
|
| D609652, |
Jul 22 2008 |
Tokyo Electron Limited |
Wafer attracting plate |
| D633452, |
Aug 27 2009 |
Ebara Corporation |
Elastic membrane for semiconductor wafer polishing apparatus |
| JP2005033139, |
|
|
|
| JP2010105144, |
|
|
|
| KR100928450, |
|
|
|